The task of the reproducibility of the properties of film coatings of complex composition formed by vacuum-plasma technologies, can be solved with the help of the automatic flow control process gases.
In modern technologies of deposition of coatings by vacuum methods, ion sources appear a necessary technological tool.
The optimization of magnetron sources structure, the usage of a high-current water-cooled solenoid extend both the technical possibilities and the specifications of sputtering magnetron systems.
The modification of a surface by middle energy ions provides increasing of properties of those products for which the other methods of treatment are practically impossible.
The usage of the system is especially effective in the technology of creation of sophisticated optical coatings (antireflection, reflection, interference light filters).
The e-beam evaporation have 4 of the crucible, the standard size of the company Umicore, a volume of 4 cm3 and have the shape of a truncated inverted cylinder 10 mm high, 27 mm radius top and bottom - 21 mm.
The plasma vacuum arc sources found an effective application basically in deposition of hardening coatings.
The company "Technologies and Supply" is developing, manufacturing vacuum chambers with horizontal, vertical axis arrangement with dimensions up to 2500 mm in diameter and a height of 3000 mm.