The optimization of magnetron sources structure, the usage of a high-current water-cooled solenoid extend both the technical possibilities and the specifications of sputtering magnetron systems.
The usage of unbalanced magnetrons, if to compare with the traditional ones, permits to produce coatings with a higher productivity and to enlarge significantly the effective operational zone of the sources.
Specifications of the magnetron sources
- Target dimensions, mm:
- length - to 2500,
- width - 80-200,
- thickness - to 12.
- Working voltage, V - 380-600.
- Working current, A - 2-60.
- Power supply, kW - 10-50.