Components for Vacuum Systems

Automatic Gases Flow Control Device PPC-1000

Automatic gases flow control device PPC 1000The task of the reproducibility of the properties of film coatings of complex composition formed by vacuum-plasma technologies, can be solved with the help of the automatic flow control process gases.

Ion Sources

Ion sourcesIn modern technologies of deposition of coatings by vacuum methods, ion sources appear a necessary technological tool.

Magnetron Sources

Magnetron sourcesThe optimization of magnetron sources structure, the usage of a high-current water-cooled solenoid extend both the technical possibilities and the specifications of sputtering magnetron systems.

Sources of Mo, V, W and Other Solids Ion Sources with Energy to 50000 eV

The modification of a surface by middle energy ions provides increasing of properties of those products for which the other methods of treatment are practically impossible.

Spectrometrical Systems for Control of Spectrum and Thickness of Coatings

Spectrometrical systems for control of spectrum and thickness of coatingsThe usage of the system is especially effective in the technology of creation of sophisticated optical coatings (antireflection, reflection, interference light filters).

The Electron Beam Evaporation

The e-beam evaporation have 4 of the crucible, the standard size of the company Umicore, a volume of 4 cm3 and have the shape of a truncated inverted cylinder 10 mm high, 27 mm radius top and bottom - 21 mm.

Vacuum Arc Sources

Vacuum arc sourcesThe plasma vacuum arc sources found an effective application basically in deposition of hardening coatings.

Vacuum Chambers

Vacuum chambersThe company "Technologies and Supply" is developing, manufacturing vacuum chambers with horizontal, vertical axis arrangement with dimensions up to 2500 mm in diameter and a height of 3000 mm.